A two-dimensional PIC/MCC model is developed to simulate the nitrogen radio frequency hollow cathode discharge（rf-HCD）.It is found that both the sheath oscillation heating and the secondary electron heating together play a role to maintain the rf-HCD under the simulated conditions.The mean energy of ions（N＋_2,N＋）in the negative glow region is greater than the thermal kinetic energy of the molecular gas（N2）,which is an important characteristic of rf-HCD.During the negative portion of the hollow electrode voltage cycle,electrons mainly follow pendulum movement and produce a large number of ionization collisions in the plasma region.During the positive voltage of the rf cycle,the axial electric field becomes stronger and its direction is pointing to the anode（substrate）,therefore the ions move toward the anode（substrate）via the axial electric field acceleration.Compared with dc-HCD,rf-HCD is more suitable for serving as a plasma jet nozzle at low pressure.
A hybrid PIC/MC model is developed in this work for H2-xN2 capacitively coupled radio-frequency （CCRF） discharges in which we take into account 43 kinds of collisions reaction processes between charged particles （e-, H3＋, H＋, H＋, N＋, N＋） and ground-state molecules （H2, H＋ N2）. In addition, the mean energies and densities of electrons and ions （ 3, H＋, H＋）, and electric field distributions in the H2-N2 CCRF discharge are simulated by this model. Furthermore, the effects of addition of a variable percentage of nitrogen （0-30%） into the H2 discharge on the plasma processes and discharge characteristics are studied. It is shown that by increasing the percentage of nitrogen added to the system, the RF sheath thickness will narrow, the sheath electric field will be enhanced, and the mean energy of hydrogen ions impacting the electrodes will be increased. Because the electron impact ionization and dissociative ionization rates increase when N2 is added to the system, the electron mean density will increase while the electron mean energy and hydrogen ion density near the electrodes will decrease. This work aims to provide a theoretical basis for experimental studies and technological developments with regard to H2-N2 CCRF plasmas.
It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show that： with an increasing flow rate, the total ion（N＋2, N＋） density decreases, the mean sheath thickness becomes wider, the radial electric field in the sheath and the axial electric field show an increase, and the energies of both kinds of nitrogen ions increase;and, as the axial ion current density that is moving toward the ground electrode increases, the ion current density near the ground electrode increases. The simulation results will provide a useful reference for plasma jet technology involving rf hollow cathode discharges in N2.
