在利用光刻将拓扑绝缘体外延薄膜加工成微米尺寸结构的过程中,所用的各种化学物质会导致薄膜质量的下降.在实验中,通过在钛酸锶衬底上预先光刻出Hall bar形状的凸平台并以此为模板进行拓扑绝缘体(Bi x Sb1-x)2Te3薄膜的分子束外延生长,直接获得了薄膜的Hall bar微器件,从而避免了光刻过程对材料质量的影响.原子力显微镜和输运测量结果均显示该微器件保持了(Bi x Sb1-x)2Te3外延薄膜原有的性质.这种新的微器件制备方法有助于在拓扑绝缘体中实现各种新奇的量子效应,并可推广于其他外延生长的低维系统.
High quality chromium （Cr） doped three-dimensional topological insulator （TI） Sb2Te3 films are grown via molecular beam epitaxy on heat-treated insulating SrTiO3 （111） substrates. We report that the Dirac surface states are insensitive to Cr doping, and a perfect robust long-range ferromagnetic order is unveiled in epitaxial Sb2 xCrxTe3 films. The anomalous Hall effect is modulated by applying a bottom gate, contrary to the ferromagnetism in conventional diluted magnetic semiconductors （DMSs）, here the coercivity field is not significantly changed with decreasing cartier density. Carrier-independent ferromag- netism heralds Sbz_xCrxTe3 films as the base candidate TI material to realize the quantum anomalous Hall （QAH） effect. These results also indicate the potential of controlling anomalous Hall voltage in future TI-based magneto-electronics and spintronics.
Cui Zu ChangMin Hao LiuZuo Cheng ZhangYa Yu WangKe HeQi Kun Xue
