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国家重点基础研究发展计划(2007CB935400)

作品数:13 被引量:18H指数:3
相关作者:徐岭徐骏马忠元吴良才宋志棠更多>>
相关机构:中国科学院南京大学同济大学更多>>
发文基金:国家重点基础研究发展计划国家自然科学基金上海市科学技术委员会资助项目更多>>
相关领域:自动化与计算机技术电子电信理学轻工技术与工程更多>>

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13 条 记 录,以下是 1-10
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相变存储器中驱动二极管之间串扰电流的分析与减小方法
2010年
由于二极管在单元尺寸上的优势,被认为是高密度相变存储器中驱动管的不二之选。如果制备二极管的工艺参数不恰当,则大的漏电流会影响PCRAM存储数据的准确性和长久的保持力。首先简要介绍了具有自主知识产权的相变存储器中驱动二极管阵列的制备方法,然后从载流子分布以及半导体器件角度,分析了驱动二极管之间串扰电流的产生原因,最后,依据工艺流程介绍了一种简单的方法来减小驱动二极管之间的串扰电流。依据SM IC的工艺进行TCAD仿真,结果表明此种方法能够在增大驱动电流的同时大大减小串扰电流。
李宜瑾凌云宋志棠龚岳峰罗胜钦贾晓玲
关键词:相变存储器TCAD
Synthesis and characterization of phase change memory cells
2009年
Phase change memory (PCM) cells based on Ge2Sb2Te5 were synthesized and investigated. Currentvoltage measurements demonstrated different final resistances. Transmission electron microscopy (TEM),high resolution electron microscopy (HREM) and the energy dispersive X-ray spectroscopy (EDS) analyses were used to characterize the microstructures of the PCM cells. The architectures,structures and defects in the cells including the deposited elemental distributions and the interfacial structures between electrodes and barrier layers were studied in detail.
WANG KeHAN XiaoDongZHANG ZeWU LiangCaiLIU BoSONG ZhiTangFENG SongLin
关键词:ELECTRONMICROSCOPYMICROSTRUCTUREMULTILAYERSTRUCTURE
基于0.13μm工艺的8Mb相变存储器被引量:4
2011年
采用0.13μm工艺,4层金属布线,在标准CMOS技术的基础上增加3张掩膜制备了一款8Mb相变存储器。1.2V的低压NMOS管作为单元选通器,单元大小为50F2。外围电路采用3.3V工作电压的CMOS电路。Set和Reset操作电流分别为0.4mA和2mA。读出操作的电流为10μA,芯片疲劳特性次数超过了108。
蔡道林陈后鹏王倩丁晟富聪陈一峰宏潇李喜陈小刚刘波宋志棠封松林
关键词:相变存储器
铜纳米颗粒吸收光谱特性研究被引量:6
2008年
采用蒸汽冷凝法制备了10~100 nm的铜纳米颗粒,然后将纳米铜分散在水溶液中,通过重力沉降法得到一系列不同尺度的铜纳米颗粒溶液.用光栅光谱仪检测其透射光谱,并进行分析处理.结果表明,不同尺寸的纳米铜颗粒均有2个吸收峰,峰值波长分别在450 nm和610 nm左右,并且随着铜纳米颗粒尺度的减小,吸收峰向短波长移动.纳米铜颗粒的光吸收谱中出现的双峰结构,我们认为来自于其特有的表面等离激元吸收峰.
朱振邦赵亮周惠君吴卫国徐岭
关键词:铜纳米颗粒吸收光谱
Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid
2011年
We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with picolinic acid is as high as 76.6 in the chemical mechanical polishing. By using zeta potential analyzer, particle size analyzer, horizon profilometer, thermogravimetric analysis and Fourier transform infrared spectroscopy, the pre- and the post-polished wafer surfaces as well as the pre- and the post-used ceria-based slurries are compared. Possible mechanism of high oxide to nitride selectivity with using ceria-based slurry with picolinic acid is discussed.
王良咏刘波宋志棠刘卫丽封松林黄丕成S.V Babu
关键词:CERIAORIGIN
Phase Change Memory cell design by thermal analysis with Finite element Simulation
A comprehensive thermal analysis of the Phase change random memory(PCRAM) by 3D finite element modeling is pro...
Yue-Feng GongYun LingZhi-Tang SongSong-lin Feng
Below-diffraction-limited hybrid recording using silicon thin film super-resolution structure
2009年
We report on new experimental results for below-diffraction-limited hybrid recording. In our experiments, by means of focused laser assisted magnetic recording, the magnetic domains within TbFeCo thin films are obtained under an external perpendicular direct magnetic field. For a single magnetic medium, the domain size is mainly determined by the focused spot, which is about 620 nm for the laser wavelength λ=406 nm, and a numerical aperture of the lens of 0.80. However, when a silicon thin film structure is inserted between the substrate and the magnetic medium, the recording domains can be reduced obviously. By optimizing the experimental condition, even the size can be reduced to about 100 nm, which is below the diffraction limit, i.e. about 1/6 of the spot size. This is very useful for improving the hybrid recording density in practical applications.
焦新兵魏劲松干福熹
关键词:SUPER-RESOLUTION
纳米球刻蚀法制备的二维有序的CdS纳米阵列及其光学性质的研究被引量:4
2008年
采用纳米球刻蚀(nanosphere lithography)技术,以自组装的聚苯乙烯纳米小球(polystyrene,PS小球)的单层膜为掩模,制备出二维有序的CdS纳米阵列.利用扫描电子显微镜(SEM)对样品结构进行了表征,用紫外—可见分光光度计对样品光学性质进行了分析.结果表明:制备的二维CdS纳米阵列是高度有序的,且与作为掩模的纳米小球的原始尺寸及排布结构一致;禁带宽度为2.60eV,相对于体材料的2.42eV,向短波长蓝移了0.18eV,表现出CdS材料在纳米结构点阵中的量子尺寸效应;CdS纳米阵列在长波段透光性较好,短波段透光性几乎为零,表现出良好的光透选择性.
孙萍徐岭赵伟明李卫徐骏马忠元吴良才黄信凡陈坤基
关键词:光学性质半导体材料
Three-Dimensional Finite Element Simulations for the Thermal Characteristics of PCRAMs with Different Buffer Layer Materials
2010年
Simulation of the heat consumption in phase change random access memories (PCRAMs) is investigated by a three-dimensional finite element model. It is revealed that the thermal conductivity and electrical conductivity of the buffer layer are crucial in controlling the heating efficiency in RESET process. The buffer layer mater/Ms W, TiN, WOa, Ti02 and poly-germanium (poly-Ge) are applied in the simulation respectively, and compared with each other. The simulation results show that limitation of electrical conductivity is effective on heating efficiency and the limitation of thermal conductivity is important on the reliable RESET process.
龚岳峰宋志棠凌云刘燕李宜瑾封松林
Simulation of Voltage SET Operation in Phase-Change Random Access Memories with Heater Addition and Ring-Type Contactor for Low-Power Consumption by Finite Element Modeling被引量:1
2010年
A three-dimensional finite element model for phase change random access memory is established to simulate electric, thermal and phase state distribution during (SET) operation. The model is applied to simulate the SET behaviors of the heater addition structure (HS) and the ring-type contact in the bottom electrode (RIB) structure. The simulation results indicate that the small bottom electrode contactor (BEC) is beneficial for heat efficiency and reliability in the HS cell, and the bottom electrode contactor with size Fx=80 nm is a good choice for the RIB cell. Also shown is that the appropriate SET pulse time is lOOns for the low power consumption and fast operation.
GONG Yue-Feng SONG Zhi-Tang LING Yun LIU Yan LI Yi-Jin
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